Spatial period division exposing

Details Spatial period division exposing Spatial period division exposing

1980-04-14

1982-11-23

Newsome, John H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

350162R, 427 431, 427162, 2504821, B05D 306, G03F 900

Patent

active

043605869

ABSTRACT:
Soft carbon-K X-rays (38) expose a PMMA photoresist (31) on an oxide layer (32) of a silicon substrate (33) through a parent mask (30) separated a distance S from the resist by a spacer (34) with the parent mask slits (12, 17) defining a spatial period p to establish an intensity pattern of period p
at the photomask with S=p.sup.2
.lambda., where .lambda. is the wavelength of the incident radiation and .lambda.<p.

REFERENCES:
patent: 3615449 (1971-10-01), Greenaway
Edgar "Optica Acta" vol. 16, No. 3, pp. 281-287 1969.
Kodate et al., "Applied Optics" vol. 14, No. 2, pp. 522-525 Feb. 1975.
Knop "Optics Comm." vol. 18, pp. 298-303 1976.
Rogers, "Jour. Opt. Soc. America" vol. 62, No. 7, pp. 917, 918, Ju. 1972.

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