Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1996-01-22
1998-01-13
McPherson, John A.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
349156, G02F 11339
Patent
active
057077851
ABSTRACT:
The invention provides a spacer structure and a method of forming the spacer structure for providing uniform spacing between two transparent substrates of a Liquid Crystal Display. The spacer structure uses positive photoresist pads formed on opaque pads. The opaque pads are formed on one surface of one of the transparent substrates. The positive photoresist pads are formed using the opaque pads as a mask when exposing a layer of positive photoresist. The positive photoresist pads are self aligned to the opaque pads. The self alignment of the positive photoresist pads with the opaque pads make it possible to form several layers of positive photoresist pads on each opaque pad to achieve the desired spacer height.
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patent: 5328728 (1994-07-01), Swirbel et al.
patent: 5338240 (1994-08-01), Kim
patent: 5379139 (1995-01-01), Sato et al.
patent: 5389288 (1995-02-01), Rindo et al.
Fan Yu-Hsia
Hsieh Ting-Chiang
Lo Chin-Chen
Ackerman Stephen B.
Industrial Technology Research Institute
McPherson John A.
Prescott Larry J.
Saile George O.
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