Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2007-11-01
2010-06-15
Estrada, Michelle (Department: 2823)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S942000
Reexamination Certificate
active
07737039
ABSTRACT:
Methods are disclosed, such as those involving increasing the density of isolated features in an integrated circuit. Also disclosed are structures associated with the methods. In one or more embodiments, contacts are formed on pitch with other structures, such as conductive interconnects. The interconnects may be formed by pitch multiplication. To form the contacts, in some embodiments, a pattern corresponding to some of the contacts is formed in a selectively definable material such as photoresist. The features in the selectively definable material are trimmed to desired dimensions. Spacer material is blanket deposited over the features in the selectively definable material and the deposited material is then etched to leave spacers on sides of the features. The selectively definable material is removed to leave a mask defined by the spacer material. The pattern defined by the spacer material may be transferred to a substrate, to form on pitch contacts. In some embodiments, the on pitch contacts may be used to electrically contact conductive interconnects in the substrate.
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Sheats et al., “Microlitho
Kiehlbauch Mark
Kramer Steve
Sandhu Gurtej
Smythe John
Estrada Michelle
Knobbe Martens Olson & Bear LLP
Micro)n Technology, Inc.
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