Source for vacuum treatment process

Details Source for vacuum treatment process Source for vacuum treatment process

2005-03-22

2005-03-22

VerSteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

C204S298410, C204S298170, C204S298140, C204S298090

Reexamination Certificate

active

06869509

ABSTRACT:
The invention relates to an arc source or a source for vaporizing or sputtering of materials and a method for operating a source. The source comprises an insulated counter-electrode and/or an AC magnet system. Thereby, dependent on the requirement, any desired potential can be applied to the counter-electrode and/or the source can be operated with different magnet systems, in particular as arc or sputter source.

REFERENCES:
patent: 5298136 (1994-03-01), Ramalingam
patent: 5317235 (1994-05-01), Treglio
patent: 5676810 (1997-10-01), Schwendener
patent: 5843293 (1998-12-01), Murakami et al.
patent: 6103074 (2000-08-01), Khominich
patent: 01240645 (1989-09-01), None
patent: 2000-340165 (2000-12-01), None

Affiliated with

Also associated with

Rating

Source for vacuum treatment process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Source for vacuum treatment process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Source for vacuum treatment process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3377953