Source for the generation of large area pulsed ion and electron

Details Source for the generation of large area pulsed ion and electron Source for the generation of large area pulsed ion and electron

1997-05-30

1998-11-24

Wong, Don

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511131, 31511181, H01J 3700

Patent

active

058412352

ABSTRACT:
In a source for the generation of large-area pulsed ion or electron beams from an anode discharge electrode which has openings receiving discharge electrodes forming a vacuum arc plasma source, the discharge is safely triggered by a load which determines the total current and which consists of a parallel circuit including an ohmic resistor and a capacitor wherein the load output is adapted to the internal resistance of the pulse voltage generator. With a dimensioning of the electrical components taking into consideration given limits, a homogeneous beam of charged particles is obtained wherein the particle composition can be all the same or a homogeneous mixture of different particles depending on the choice of electrode materials.

REFERENCES:
patent: 4786844 (1988-11-01), Farrell et al.

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