Radiant energy – Ion generation – Electron bombardment type
Patent
1996-01-16
1997-10-07
Anderson, Bruce
Radiant energy
Ion generation
Electron bombardment type
31511181, H01J 2700
Patent
active
056751524
ABSTRACT:
An improved ion implant filament assembly, including shielding and insulation spacers, is provided that reduces the unwanted metal coating between the filament ends which shorts out the filament. An important parts of the invention are ridges on a filament shield which prevent coatings between filament ends and spacer insulators between the filament shield and the stage. The invention comprises a filament having a two parallel extending leads; two screws, each having a central hole; the leads extending through the central hole; a filament shield having two spaced apertures, the spaced apertures receiving the screws from a front side; the filament shield having annular ridges on the back side; a stage having two spaced apertures and a means to fix the stage to the source chamber; two annular spacer insulators positioned between the filament shield and the stage; and two end insulators each having a central aperture adapted to received one of the screws.
REFERENCES:
patent: 5049784 (1991-09-01), Matsudo
patent: 5256947 (1993-10-01), Troy et al.
patent: 5262652 (1993-11-01), Bright et al.
patent: 5370568 (1994-12-01), Irins et al.
patent: 5517077 (1996-05-01), Bright et al.
Anderson Bruce
Saile George O.
Stoffel William J.
Taiwan Semiconductor Manufacturing Company , Ltd.
LandOfFree
Source filament assembly for an ion implant machine does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Source filament assembly for an ion implant machine, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Source filament assembly for an ion implant machine will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2359556