Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1992-06-29
1995-03-14
Pascal, Robert J.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511181, H05B 3700
Patent
active
053979621
ABSTRACT:
A source and method for generating high density plasma with inductive radio-frequency power coupling is provided in which coil antenna sections (34) within a plasma source (12) are used to generate a high-density uniform plasma. This plasma is then guided into transferred in a transfer chamber (14) and then to a processing chamber (16). Within the processing chamber (16), the plasma reacts with a semiconductor wafer (18) or another workpiece for plasma-enhanced deposition or etch processing.
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Article by A. J. Perry, D. Vender, and R. W. Boswell, "The Application of the Helicon Source to Plasma Processing", J. Vac. Sci. Technol. B 9 (2), Mar./Apr., 1991, pp. 310-317.
Donaldson Richard L.
Hiller William E.
Pascal Robert J.
Rutkowski Peter T.
Shingleton Michael B.
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