SOR exposure system and mask manufactured thereby

Details SOR exposure system and mask manufactured thereby SOR exposure system and mask manufactured thereby

1996-08-26

1997-04-22

Wong, Don

X-ray or gamma ray systems or devices

Specific application

Lithography

G21K 500

Patent

active

056235291

ABSTRACT:
In an X-ray lithographic system comprising a plurality of X-ray exposure apparatus which use an SOR radiation source apparatus as a common illumination light source, an exposure apparatus usable for duplicating an X-ray mask is connected to at least one beam line. The beam line is longer than the other wafer exposure beam lines so that the divergence angle is small (i.e., the resolving power for exposure transfer is higher). Thus, the X-ray mask can precisely be manufactured at low cost.

REFERENCES:
patent: 4788698 (1988-11-01), Kimura et al.
patent: 5123036 (1992-06-01), Uno et al.
patent: 5125014 (1992-06-01), Watanabe et al.
patent: 5128975 (1992-07-01), Iwamoto et al.
patent: 5150151 (1992-09-01), Mochizuki et al.
patent: 5168512 (1992-12-01), Iwamoto et al.
patent: 5172402 (1992-12-01), Mizusawa et al.
"X-ray replication of masks using the synchrotron radiation produced by the ACO storage ring"; Sep. 15, 1976; pp. 370-372.

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