SOR exposure system

Details SOR exposure system SOR exposure system

1989-09-01

1991-03-19

Fields, Carolyn E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, 2564922, G21K 500

Patent

active

050017349

ABSTRACT:
Synchrotron orbital radiation (SOR) exposure system includes a SOR ring and a plurality of exposure apparatus each being coupled to the SOR ring and being arranged to expose a wafer to a mask pattern with X-rays contained in synchrotron radiation from the SOR ring to thereby print the mask pattern on the wafer. Specific arrangement is provided to allow communication of a control of the SOR ring and respective controls of the exposure apparatuses. If any abnormality such as vacuum leakage occurs in one exposure apparatus, the information is transmitted to all the controls to start, in all the exposure apparatuses, appropriate operations to protect the exposure apparatuses against the abnormality. This makes it possible to prevent stoppage of the SOR exposure system as a whole even when any abnormality occurs in one exposure apparatus.

REFERENCES:
patent: 4748646 (1988-05-01), Osada et al.
patent: 4788698 (1988-11-01), Kimura et al.
patent: 4803713 (1989-02-01), Fujii
H. Betz, "High Resolution Lithography Using Synchrotron Radiation," Elsevier Science Publishers, May, 1986, pp. 658 through 667.
Okada et al., "Development of Highly Reliable Synchrotron Radiation Lithography Beamline," J. Vac. Sci. Tech. B6(1), Jan./Feb. 1988, pp. 191-194.

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