Solvent developable photoresist composition and process of use

Details Solvent developable photoresist composition and process of use Solvent developable photoresist composition and process of use

1986-03-17

1987-12-29

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430263, 430260, 430910, 430281, 522116, 522117, 522121, G03C 1495, G03C 168

Patent

active

047160934

ABSTRACT:
Solvent developable composition useful as photoresist contains binder formed from methylmethacrylate and a C.sub.2 to C.sub.4 alkyl methacrylate whereby improved development and/or stripping is obtained.

REFERENCES:
patent: 3469982 (1969-09-01), Celeste
patent: 3989610 (1976-11-01), Tsukada et al.
patent: 4289841 (1981-09-01), Cohen et al.
patent: 4339474 (1982-07-01), Kishida et al.
patent: 4349620 (1982-09-01), Cyr et al.
patent: 4469777 (1984-09-01), O'Neil
patent: 4510593 (1985-04-01), Daniels

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