Soluble photosensitive resin composition

Details Soluble photosensitive resin composition Soluble photosensitive resin composition

1978-09-25

1980-06-24

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415916, 20415915, 430286, 430288, G03C 168

Patent

active

042095816

ABSTRACT:
A photocurable soluble resin suitable for manufacturing photosensitive resin plates obtained by polycondensing an alkylol derivative or an alkylated alkylol derivative of urea or thiourea with an N-alkylolacrylamide or N-alkylolmethacrylamide in the presence of an acid or an ammonium salt thereof or by reacting urea or thiourea with formaldehyde to form a linear polycondensation product and then grafting an N-alkylolacrylamide or N-alkylolmethacrylamide on the linear polycondensation product in the presence of an acid or an ammonium salt thereof. This soluble resin is incorporated with known soluble resins such as soluble nylon, photosensitizers and thermal polymerization inhibitors and mixed thoroughly to obtain a soluble photosensitive resin composition.

REFERENCES:
patent: 3427161 (1969-02-01), Laridon et al.
patent: 3734725 (1973-05-01), Bailey
patent: 3801638 (1974-04-01), Cerwonka
patent: 3809633 (1974-05-01), Magnotta et al.
patent: 3833384 (1974-09-01), Noonam et al.
patent: 3867548 (1975-02-01), Hirschmann

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