Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2006-11-15
2010-06-15
Smith, Matthew (Department: 2823)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S072000, C438S078000, C257SE21027, C257SE21256
Reexamination Certificate
active
07737044
ABSTRACT:
A method of manufacturing a solid state imaging device having photoelectric conversion devices, the method including: 1) forming a plurality of color filters differing in color from each other, 2) forming a transparent resin layer on the color filters, 3) forming an etching control layer on the transparent resin layer, the etching control layer being enabled to be etched at a different etching rate from the etching rate of the transparent resin layer, 4) forming a lens master on the etching control layer by using a heat-flowable resin material, 5) transferring a pattern of the lens master to the etching control layer by dry etching to form an intermediate micro lens, and 6) transferring a pattern of the intermediate micro lens to the transparent resin layer by dry etching to form the transfer lenses.
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Fukuyoshi Kenzo
Ishimatsu Tadashi
Nakao Mitsuhiro
Ogata Keisuke
Uchibori Akiko
Jefferson Quovaunda
Smith Matthew
Toppan Printing Co. Ltd.
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