Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2007-06-19
2007-06-19
Potter, Roy (Department: 2822)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S757000
Reexamination Certificate
active
11159367
ABSTRACT:
A solid-state imaging device including a photoelectric conversion portion and a charge transfer portion equipped with charge transfer electrodes to transfer the charge generated in the photoelectric conversion portion, wherein the charge transfer portion is provided with a charge transfer electrodes having a first electrode including a first layer electric conductive film, and a second electrode having a second layer electric conductive film provided contiguously to the first electrode with an electrode insulating film therebetween, and the first electrode is coated with a silicon oxide film that is the electrode insulating film formed by side wall oxidation in the state that the upside is coated with an antioxidizing film so as to coat the side wall.
REFERENCES:
patent: 5817562 (1998-10-01), Chang et al.
patent: 6656840 (2003-12-01), Rajagopalan et al.
patent: 2005/0274995 (2005-12-01), Park
patent: 8-274302 (1996-10-01), None
Nakahashi Yousuke
Shizukuishi Makoto
Takao Hiroaki
Birch & Stewart Kolasch & Birch, LLP
Fujifilm Corporation
Potter Roy
LandOfFree
Solid state imaging device and method of manufacturing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Solid state imaging device and method of manufacturing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Solid state imaging device and method of manufacturing the same will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3814094