Solid-state imaging device and method for manufacturing the...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S436000

Reexamination Certificate

active

07135725

ABSTRACT:
A solid-state imaging device of the present invention is provided with a plurality of photodiodes arranged in a one-dimensional or a two-dimensional arrangement, inorganic dielectric films that are made of a translucent inorganic substance, formed on the photodiode, and a hollow layer that is formed within the inorganic dielectric film and sandwiched between an inner lateral wall and an outer lateral wall formed with the inorganic dielectric film, wherein the hollow layer has a funnel shape whose aperture widens from an end portion near an upper portion of the photodiode with increasing distance from the photodiode. Light that is incident on a region above the photodiode area can be focused effectively onto the photodiode over a wide range.

REFERENCES:
patent: 2005/0110059 (2005-05-01), Kato
patent: 6-224398 (1994-08-01), None
patent: 2869280 (1998-12-01), None

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