Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2008-06-03
2008-06-03
Cao, Phat X (Department: 2814)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S294000, C257S462000, C257SE31122
Reexamination Certificate
active
07382011
ABSTRACT:
A solid-state image sensing device having an effective pixel area and an optical black area disposed on one principal surface of a substrate, includes photoelectric converter elements, a wiring part containing a plurality of wiring layers disposed on the one principal surface of the substrate, in which in the optical black area more wiring layers are disposed than in the effective pixel area, an interlayer dielectric disposed between, among the plurality of wiring layers, a topmost first wiring layer and a second wiring layer disposed beneath the first wiring layer, a passivation film disposed on the interlayer dielectric in the effective pixel area and disposed on the first wiring layer in the optical black area, and inner lenses disposed at least at positions on the passivation film that corresponds to the effective pixel area, a thickness of the passivation film being equal to or less than a thickness of the first wiring layer.
REFERENCES:
patent: 2005/0110002 (2005-05-01), Noda
patent: 2006/0038209 (2006-02-01), Hashimoto
patent: 2007/0115377 (2007-05-01), Noda et al.
patent: 2005-012189 (2005-01-01), None
Fujino Yuya
Noda Tomoyuki
Canon Kabushiki Kaisha
Cao Phat X
Fitzpatrick ,Cella, Harper & Scinto
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