Solid-state image pickup element and process for fabricating the

Details Solid-state image pickup element and process for fabricating the Solid-state image pickup element and process for fabricating the

1980-09-18

1982-08-17

Brown, J. Travis

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430311, 430312, 430313, 250211J, 250578, 156643, 156655, 156656, 1566611, G03C 500

Patent

active

043450210

ABSTRACT:
A highly sensitive and high-density picture element solid-state image pickup element and a process for fabricating the same which is featured in (a) that in the step for patterning a photoconductive layer, a protective pattern resisting an etchant is formed by using an ultraviolet-ray-setting resin which is also used in the step for bonding a color filter and then the undesired areas of the photoconductive layer, which has been formed over the whole surface of a wafer, are removed and (b) that the color filter having a stripe or mosaic pattern is bonded to the protective pattern with the same ultraviolet-ray-setting resin. Alternatively, after the color filter has been bonded, the undesired areas of the photoconductive layer are removed with the color filter used as an etching mask.

REFERENCES:
patent: 3858304 (1975-01-01), Leedy et al.
patent: 3968360 (1976-07-01), Monnier
patent: 4012587 (1977-03-01), Ochi et al.
patent: 4081841 (1978-03-01), Ochi et al.
patent: 4232110 (1980-11-01), Taylor

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