Solar cell manufacturing method

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal

Reexamination Certificate

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Details

C438S057000, C438S069000, C438S071000, C257SE25004, C257SE25007

Reexamination Certificate

active

07741139

ABSTRACT:
A method of manufacturing a solar cell includes forming a diffusion layer on a crystal-type silicon substrate. The diffusion layer has a conductivity opposite to that of the substrate. Furthermore, the method includes etching and removing a part of the diffusion layer by using sodium silicate, and forming a first electrode that makes an electric contact with the diffusion layer and forming a second electrode that makes an electric contact with the substrate.

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patent: 100 32 279 (2002-01-01), None
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“Silicon Etching Pastes for Edge Isolation,” product description for SolarEtch Si, 2004, 3 pages, Merck KGaA, D-64271 Darmstadt, Germany.
German Office Action, with English-Language Translation, dated Nov. 26, 2009.

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