SOI contact structures

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S471000, C257S306000

Reexamination Certificate

active

07485926

ABSTRACT:
Disclosed are an arrangement and a production method for electrically connecting active semiconductor structures in or on a monocrystalline silicon layer (12) located on the front face (V) of silicon-on-insulator semiconductor wafers (SOI,10) to the substrate (13). The electrical connection (20) is made through an insulator layer (11). A stack of layers (30to32, 70to72) is disposed above the connection piece (20) on the insulator layer (11).

REFERENCES:
patent: 5241211 (1993-08-01), Tashiro
patent: 5479048 (1995-12-01), Yallup et al.
patent: 5569621 (1996-10-01), Yallup et al.
patent: 5610083 (1997-03-01), Chan et al.
patent: 5838045 (1998-11-01), Muller et al.
patent: 6124615 (2000-09-01), Lee
patent: 6191007 (2001-02-01), Matsui et al.
patent: 6221738 (2001-04-01), Sakaguchi et al.
patent: 6271541 (2001-08-01), Yamaguchi et al.
patent: 6272736 (2001-08-01), Lee
patent: 6303414 (2001-10-01), Ang et al.
patent: 6399460 (2002-06-01), Yamaguchi et al.
patent: 6407429 (2002-06-01), Ko et al.
patent: 6806470 (2004-10-01), Iida et al.
patent: 7075151 (2006-07-01), Shino
patent: 7227264 (2007-06-01), Kato
patent: 7279375 (2007-10-01), Radosavljevic et al.
patent: 2002/0022328 (2002-02-01), Ang et al.
patent: 2002/0045298 (2002-04-01), Takahashi
patent: 2002/0119608 (2002-08-01), Ko et al.
patent: 2002/0130347 (2002-09-01), Fechner et al.
patent: 2002/0195638 (2002-12-01), Fechner et al.
patent: 2004/0106247 (2004-06-01), Takahashi
patent: 2005/0104134 (2005-05-01), Kato
patent: 2005/0121710 (2005-06-01), Shino
patent: 2006/0160339 (2006-07-01), Richter et al.
patent: 2007/0132009 (2007-06-01), Takeuchi et al.
patent: 2007/0235833 (2007-10-01), Cheng et al.
patent: 2008/0017906 (2008-01-01), Pelella et al.
patent: 2008/0048186 (2008-02-01), Cheng et al.
patent: 2000-012868 (2000-01-01), None
patent: 02/073667 (2002-09-01), None
English Language Abstract of JP 2000-012868.

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