SOG coated apparatus to solve SOG non-uniformity in the VLSI pro

Details SOG coated apparatus to solve SOG non-uniformity in the VLSI pro SOG coated apparatus to solve SOG non-uniformity in the VLSI pro

1994-12-01

1995-10-03

Chin, Peter

Coating apparatus

Projection or spray type

118 52, 118 64, 118 66, 118319, 118320, 118324, 118326, 118708, 118725, 118730, B05B 1500

Patent

active

054548713

ABSTRACT:
An apparatus for applying spin-on-glass material to a wafer under controlled humidity conditions is described, The apparatus comprises a treatment chamber. Within the treatment chamber are a spin-on-glass coater spin table, a plurality of hotplates connected to one another and from the coater spin table by a moving belt, and wafer handlers to transfer wafers onto the coater spin table and onto the moving belt. A dehumidifier is disposed on top of the treatment chamber and a humidity control unit is disposed on top of the dehumidifier through which air is drawn and whereby relative humidity within the treatment chamber can be controlled.

REFERENCES:
patent: 3537425 (1970-11-01), David et al.
patent: 4286541 (1981-09-01), Blackwood
patent: 4609037 (1986-09-01), Wheeler et al.
patent: 4790262 (1988-12-01), Nakayama et al.
patent: 5051338 (1991-09-01), Kato et al.
patent: 5106787 (1992-04-01), Yen
patent: 5143552 (1992-09-01), Moriyama
patent: 5221347 (1993-06-01), Heine

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