X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1989-02-09
1991-03-26
Fields, Carolyn E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378 35, 378 84, G21K 500
Patent
active
050035673
ABSTRACT:
Soft x-ray projection lithography can be performed using x-ray optical components and spherical imaging lenses (mirrors), which form an x-ray reduction camera. The x-ray reduction is capable of projecting a 5x demagnified image of a mask onto a resist coated wafer using 4.5 nm radiation. The diffraction limited resolution of this design is about 135 nm with a depth of field of about 2.8 microns and a field of view of 0.2 cm.sup.2. X-ray reflecting masks (patterned x-ray multilayer mirrors) which are fabricated on thick substrates and can be made relatively distortion free are used, with a laser produced plasma for the source. Higher resolution and/or larger areas are possible by varying the optic figures of the components and source characteristics.
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Hawryluk Andrew M.
Seppala Lynn G.
Carnahan L. E.
Fields Carolyn E.
Moser William R.
Porta David P.
Sartorio Henry P.
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