Soft X-ray lithography system

X-ray or gamma ray systems or devices – Specific application – Lithography

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378 14D, 378143, 430967, G03B 4116

Patent

active

043887287

ABSTRACT:
A soft X-ray lithography system including an X-ray tube having an evacuated and sealed-off envelope provided with an X-ray transparent window made of beryllium material and enclosing a rotatable anode target made of graphite material, the target having an annular sloped surface carrying a focal track layer made of titanium carbide material and having a focal spot area aligned with an electron emitting cathode to generate characteristic titanium K alpha X-rays which pass in a beam through the window, a mask aligned with the window and having transparent portions which transmit the beamed X-rays, and a workpiece, such as a semiconductor wafer, for example, having a surface coated with a photoresist film disposed in alignment with the mask to have selected portions of the film irradiated by the X-rays transmitted through the transparent portions of the mask.

REFERENCES:
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patent: 3679927 (1972-07-01), Kirkendall
patent: 3710162 (1973-01-01), Bougle
patent: 3743842 (1973-07-01), Smith et al.
patent: 3942015 (1976-03-01), Huxley
patent: 3969131 (1976-07-01), Fatzer et al.
patent: 4184078 (1980-01-01), Nagel et al.
patent: 4185202 (1980-01-01), Dean et al.
patent: 4215192 (1980-07-01), Buckley
Hughes et al., "X-Ray Lithography Breaks the VLSI Cost Barrier," Electronics, Nov. 9, 1978, p. 103.
Fredericks et al., "X-Ray Resist Process," IBM Technical Disclosure Bulletin, vol. 19, No. 11, Apr. 1977.

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