Soft X-ray lithographic system

Details Soft X-ray lithographic system Soft X-ray lithographic system

1989-11-14

1990-07-31

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378145, G21K 500

Patent

active

049455516

ABSTRACT:
A soft X-ray lithographic system for making a reduced copy of a pattern is described. The system contains a source of soft X-rays, a spherical concave reflector which convergently projects the soft X-rays from the emitting means through a pattern to be copied and a Fresnel zone plate which focuses and reduces the beam of soft X-rays convergently projected through the pattern.

REFERENCES:
patent: 4411013 (1983-10-01), Takasu et al.
patent: 4693933 (1987-09-01), Keem et al.
"Ultrafine Line Projection System", by Feder et al., IBM Tech. Disclosure Bulletin, vol. 16, No. 9, 2-1974.
"X-ray Zone Plates Fabricated Using e.sup.- Beam & X-ray Lithography", by Shaver et al., J. Vac. Sci. Tech. 16(6), Nov./Dec. 1979, pp. 1626-1630.
"The Renaissance of X-Ray Optics", by Underwood et al., Physics Today, Apr. 1984, pp. 44-52.
"Recent Developments Towards High Resolution X-Ray Imaging", by Spiller, Nuclear Inst. & Methods, vol. 177, 11-1980, 378-84, No. 1, pp. 187-192.
Kobe, Demagnified Projection Printing by a New X-Ray Lithographic System Using No Thin-Film Patter Masks, Aug. 1984.

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