Soft magnetic alloy film

Details Soft magnetic alloy film Soft magnetic alloy film

1990-09-27

1993-01-05

Niebling, John

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

148108, 148122, 148518, 2041922, C23C 1434

Patent

active

051768062

ABSTRACT:
A soft magnetic alloy film has a composition formula expressed by Fex Mz Cw. M is at least one metallic element selected from a group consisting of Ti, Zr, Hf, Nb, Ta, Mo or W, or a mixture of these metallic elements. The composition ratio of x, z and w satisfies the relation expressed by 50 atomic % .ltoreq.x.ltoreq.96 atomic %, 2 atomic % .ltoreq.z.ltoreq.30 atomic %, 0.5 atomic % .ltoreq.w.ltoreq.25 atomic %, and x+z+w=100. The metallic structure of the soft magnetic alloy film basically consists of crystal grains having an average grain size of 0.08 .mu.m or below. The metallic structure contains the crystal phase of carbide of the element M.

REFERENCES:
patent: 4904543 (1990-02-01), Sakakima et al.
patent: 4944805 (1990-07-01), Nakanishi
John L. Vossen et al, Thin Film Processes, Academic Press, New York, 1978, pp. 48-50.
R. V. Stuart, Vacuum Technology, Thin Films and Sputtering, Academic Press, New York, 1983, pp. 130-131.

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