Smart conditioner rinse station

Details Smart conditioner rinse station Smart conditioner rinse station

2007-04-27

2009-11-03

Rose, Robert (Department: 3727)

Abrading

Abrading process

With tool treating or forming

C451S443000

Reexamination Certificate

active

07611400

ABSTRACT:
A method and apparatus for monitoring polishing pad conditioning mechanisms is provided. In one embodiment, a semiconductor substrate polishing system includes a rinse station, a polishing surface, a conditioning element, and a conditioning mechanism. The conditioning mechanism selectively positions the conditioning element over the polishing surface and over the rinse station. At least one sensor is provided and is configured to detect a first position and a second position of the conditioning element when disposed over the rinse station.

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