Slurry recycling system of CMP apparatus and method of same

Details Slurry recycling system of CMP apparatus and method of same Slurry recycling system of CMP apparatus and method of same

1999-01-21

2000-10-03

Eley, Timothy V.

Abrading

Accessory

Abradant supplying

451 60, B24B 5700

Patent

active

061265314

ABSTRACT:
A slurry recycling system of a CMP apparatus, and a method of the same, which restores the state of agglomeration of the abrasive grains to the initial state to enable reuse of the slurry and thereby reduces the cost of the polishing work and improves the operating rate of the CMP apparatus. Slurry S used in the CMP apparatus 1 is sent to a dispersion chamber 31. A vibration element 40 of an ultrasonic dispersion apparatus 4 mounted in the dispersion chamber 31 is made to vibrate by a vibrator 41 to generate ultrasonic vibration energy, whereby the agglomerated particles in the slurry S are made to disperse. Suitably thereafter, the slurry S is returned to the slurry feed apparatus 300 to enable reuse of the slurry S.

REFERENCES:
patent: 5658185 (1997-08-01), Morgan, III et al.
patent: 5664990 (1997-09-01), Adams et al.
patent: 5791970 (1998-08-01), Yueh

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