Slurry flow control and monitor system for chemical...

Details Slurry flow control and monitor system for chemical... Slurry flow control and monitor system for chemical...

2005-03-01

2005-03-01

Koczo, Michael (Department: 3746)

Pumps

Condition responsive control of pump drive motor

Responsive to change in rate of pump fluid flow

C417S313000

Reexamination Certificate

active

06860723

ABSTRACT:
A system for controlling and monitoring a rate of flow of a fluid, such as a CMP slurry, comprising a pump for pumping the slurry; a flow meter for monitoring the rate of flow of the slurry; and a controller operably connected to the flow meter and the pump. The controller receives signals from the flow meter indicating the rate of flow of the slurry and controls the operational speed of the pump responsive to the flow meter signals. A degasser equipped with a level sensor may be further provided in the system for removing gas bubbles from the slurry.

REFERENCES:
patent: 3816102 (1974-06-01), Celada et al.
patent: 4060485 (1977-11-01), Eaton
patent: 4348280 (1982-09-01), George et al.
patent: 5562834 (1996-10-01), Bremer et al.
patent: 5647386 (1997-07-01), Kaiser
patent: 5672374 (1997-09-01), McCabe
patent: 5885134 (1999-03-01), Shibata et al.
patent: 6395228 (2002-05-01), Maggard et al.
patent: 6439804 (2002-08-01), Crupi
patent: 6505134 (2003-01-01), Poleshuk et al.
patent: 2000-317811 (2000-11-01), None

Affiliated with

Also associated with

Rating

Slurry flow control and monitor system for chemical... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Slurry flow control and monitor system for chemical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Slurry flow control and monitor system for chemical... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3392024