Slope etching process

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

156656, 156657, 1566591, 156662, 156626, 156904, H01L 21306, B44C 122, C03C 1500, C23F 100

Patent

active

051748576

ABSTRACT:
A slope etching process comprising the steps of coating a photoresist on a layer of hard material, baking the photoresist under a predetermined condition so that it flows down to have at its opposite side edges respective slant surface of a desired slope angle and then dry etching simultaneously the photoresist and the hard material layer so as to provide the hard material layer at its opposite side edges with a desired slope angle. In accordance with this process, the step coverage is improved, and thus the rate of poor products and the generation of noise are reduced.

REFERENCES:
patent: 4409319 (1983-10-01), Colacino et al.
patent: 4671849 (1987-06-01), Chen et al.
patent: 4698128 (1987-10-01), Berglund et al.
patent: 4705597 (1987-11-01), Gimpelson et al.
patent: 4892613 (1990-01-01), Motai et al.

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