Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2005-08-09
2005-08-09
Zarneke, David (Department: 2891)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S689000, C438S700000, C438S691000, C438S745000, C438S046000, C438S047000, C438S734000
Reexamination Certificate
active
06927174
ABSTRACT:
A method for preparing a sample includes separating a portion of substrate from a sample, performing focused ion beam milling, and removing additional sample material using an etchant.
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Anciso Adolfo
Irwin Richard B.
Jones Patrick J.
Anya Igwe U.
Brady III W. James
McLarty Peter K.
Telecky , Jr. Frederick J.
Texas Instruments Incorporated
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