Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-08-11
2010-02-09
Wu, David (Department: 1796)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S298120, C252S500000
Reexamination Certificate
active
07658822
ABSTRACT:
Article are made from silicon oxide and electrically conductive doped silicon materials that are joined in a protective environment to yield a composite SiOx:Si material that exhibits the properties of SiOxand yet is electrically conductive due to the presence of the Si. Articles from such composite materials find many uses, such as for targets for DC and/or AC sputtering processes to produce silicon oxide thin films for touch-screen application, barrier thin films in LCD displays and optical thin films used in a wide variety of applications.
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Stevenson David E.
Zhou Li Q.
Asdjodi M. Reza
Dickinson Wright PLLC
Stearns Robert L.
Wintek Electro-Optics Corporation
Wu David
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