Single wafer heat treatment apparatus

Details Single wafer heat treatment apparatus Single wafer heat treatment apparatus

1996-07-30

1999-08-17

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

118724, 118725, 118728, C23C 1600

Patent

active

059388501

ABSTRACT:
A single wafer heat treatment apparatus in which an object to be treated placed on a susceptor supported on a heat insulating member is heat-treated by indirectly heating the object to be treated by means of heating lamps disposed under the susceptor, characterized in that a gas entry preventive member for preventing process gas from being turned about the back surface of the susceptor is provided on a peripheral edge portion of the back surface of the susceptor. With this, process gas having entered the back surface of the susceptor is consumed by the adherence of a formed film to the surface of the gas entry preventive member.

REFERENCES:
patent: 5252132 (1993-10-01), Oda et al.
patent: 5332442 (1994-07-01), Kubodera et al.
patent: 5474612 (1995-12-01), Sato et al.

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