Single wafer dryer and drying methods

Details Single wafer dryer and drying methods Single wafer dryer and drying methods

2005-10-18

2005-10-18

Basichas, Alfred (Department: 3749)

Material or article handling

Apparatus for moving material between zones having different...

C414S939000

Reexamination Certificate

active

06955516

ABSTRACT:
In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.

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