Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2005-04-12
2005-04-12
Adams, Russell (Department: 2851)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
Reexamination Certificate
active
06879400
ABSTRACT:
A metrology target mask includes a first array of spaced, substantially parallel elements having essentially the same length and width. Ends of the individual elements are aligned to form opposing array edges. The target mask also includes a second array of elements comprising a central element having a length and a width, and a plurality of spaced, substantially parallel outer elements having a length and a width. The width of the outer elements is less than the width of the central element, with edges of outer elements on each side of and farthest from the central element forming opposing array edges. The pitch of the outer elements is selected such that the outer elements are not resolvable after lithographic printing. After printing, the first array is sensitive to both dose and focus, and the second array is sensitive to dose but not focus, of the energy beam.
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Ausschnitt Christopher P.
Brunner Timothy A.
Adams Russell
DeLio & Peterson LLC
International Business Machines - Corporation
Nguyen Michelle P
Peterson Peter W.
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