Single polarizer focused-beam ellipsometer

Optics: measuring and testing – By polarized light examination – Of surface reflection

Reexamination Certificate

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Reexamination Certificate

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08009292

ABSTRACT:
The present invention relates to a single-polarizer focused-beam ellipsometer. An ellipsometer according to the present invention includes a light source (210); a beam splitting part (220) for splitting a light generated in the light source (210) into a polarized light; an objective lens (230) for concentrately irradiating some of light split by the beam splitting part (220) onto a specimen (240); a photodetector (250) for detecting the light passed through the objective lens230and the beam splitting part (220) after reflected from the specimen (240) with unit cells; and a central processing unit (260) for correcting the intensity of the light detected by the photodetector (250) into a value corresponding to the unit cell of the photodetector (250) along multiple incidence plane passage of 360° with respect to respective incidence angles and processing the corrected value.

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patent: 2008/0018895 (2008-01-01), Opsal
patent: 10-0742982 (2006-06-01), None
Masetti et al., In Situ Monitoring of film deposition with an ellipsometer based on a four detector photopolarimeter, Oct. 1996, Applied Optics, vol. 35, No. 28, pp. 5626-5629.
International Search Report-PCT/KR2008/006640 dated Dec. 22, 2008.

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