Single-piece gas director for plasma reactors

Details Single-piece gas director for plasma reactors Single-piece gas director for plasma reactors

1996-03-29

1999-08-24

Scheiner, Laurie

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

31511121, 31511171, 20429807, 414217, C23F 102

Patent

active

059420740

ABSTRACT:
Plasma etching apparatus for use in the manufacture of integrated circuit devices utilizes a one-piece director at an input of a process chamber that includes a sleeve portion and a bell jar portion. The director directs incoming process gas in the sleeve portion radially before the gas flows past electrodes used to establish a radio frequency discharge that ionizes the process gas. The one-piece director is clamped between the cap and the sleeve portion of the process chamber to eliminate the need for screws.

REFERENCES:
patent: 4632624 (1986-12-01), Mirkovich et al.

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