Single event upset (SEU) hardened static random access...

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Reexamination Certificate

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C365S181000

Reexamination Certificate

active

06208554

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Technical Field
The present invention relates to integrated circuits in general, and in particular to bi-stable integrated circuits. Still more particularly, the present invention relates to a single event upset hardened memory cell to be utilized in static random access memories.
2. Description of the Prior Art
In certain environments, such as satellite orbital space, in which the level of radiation is relatively intense, electronic devices that utilize static random access memories (SRAMs) are more susceptible to single event upsets (SEUs) or soft errors. These SEUs are typically caused by electron-hole pairs created by, and travelling along the path of, a single energetic particle as it passes through the memory cells of the SRAMs. Should the energetic particle generate a critical charge within a storage node of an SRAM cell, the logic state of the SRAM cell will be upset. Thus, the critical charge is the minimum amount of electrical charge required to change the logic state of the SRAM cell.
Referring now to the drawings and in particular to
FIG. 1
, there is illustrated a schematic diagram of a conventional memory cell that is typically used in SRAMs. Memory cell
10
is constructed with two cross-coupled complementary metal oxide semiconductor (CMOS) inverters
17
and
18
. As shown, inverter
17
includes a p-channel transistor
11
and an n-channel transistor
12
, and inverter
18
includes a p-channel transistor
13
and an n-channel transistor
14
. The gates of transistors
11
and
12
are connected to the drains of transistors
13
and
14
, and the gates of transistors
13
and
14
are connected to the drains of transistors
11
and
12
. This arrangement of inverter
17
and inverter
18
is commonly referred to as cross-coupled inverters, and the two lines connecting the gates and the drains of inverters
17
and
18
are commonly referred to as cross-coupling lines. An n-channel pass transistor
15
, having its gate connected to a wordline WL, is coupled between a bit line BL and a node S
1
. Similarly, an n-channel pass transistor
16
, also having its gate connected to wordline WL, is coupled between a bit line {overscore (BL)} and a node S
2
. When enabled, pass transistors
15
,
16
allow data to pass in and out of memory cell
10
from bit lines BL and {overscore (BL)}, respectively. Pass transistors
15
,
16
are enabled by wordline WL, which has a state that is a function of the row address within an SRAM. The row address is decoded by a row decoder (not shown) within the SRAM such that only one out of n wordlines is enabled, where n is the total number of rows of memory cells in the SRAM.
During operation, the voltages of nodes S
1
and S
2
are logical complements of one another, due to the cross-coupling of inverters
17
and
18
. When wordline WL is energized by the row decoder according to the row address received, pass transistors
15
and
16
will be turned on, coupling nodes S
1
and S
2
to bit lines BL and {overscore (BL)}, respectively. Accordingly, when wordline WL is high, the state of memory cell
10
can establish a differential voltage on BL and {overscore (BL)}.
The logic state of memory cell
10
can be changed by an SEU in many ways. For example, if a single energetic particle, such as an alpha particle, strikes the drain of p-channel transistor
11
of inverter
17
, electrons will diffuse towards a power supply V
dd
of inverter
17
, and holes collected at the drain will change the output voltage of inverter
17
at node S
1
from a logic low to a logic high when n-channel transistor
12
is on and p-channel transistor
11
is off. However, if the alpha particle strikes the drain of n-channel transistor
12
of inverter
17
, holes will drift towards ground, and electrons collected at the drain will change the output voltage of inverter
17
at node S
1
from a logic high to a logic low when p-channel transistor
11
is on and n-channel transistor
12
is off.
According to the prior art, one method of hardening a memory cell, such as memory cell
10
, against SEU is by reducing the amount of charges generated by a given particle strike. This is typically accomplished by using a silicon film thinner than the collection depth in bulk semiconductor. For example, an SRAM cell created on a thin film on an insulator, such as silicon on insulator (SOI), is much less susceptible to SEUs than an SRAM cell created on a bulk silicon because ionization charge along a path in an insulator is more likely to recombine than to be collected compared to ionization charge created in a bulk silicon. However, the processing cost of SOI is much higher than bulk silicon; thus, SOI is generally not the most preferable method. But as the number and density of memory cells and logic circuits within an integrated circuit device have rapidly grown over the years, SEU error rate has become an alarming problem that cannot be ignored, even for application environments in which the level of radiation is relatively low.
Another way to reduce the susceptibility of a memory cell, such as memory cell
10
, to SEUs is by increasing the critical charge of the memory cell. With reference now to
FIG. 2
, there is illustrated a schematic diagram of an SEU-hardened SRAM cell using a resistive approach, in accordance with the prior art. The SEU hardening scheme for SRAM cell
20
is based on increasing the critical charge required to produce SEUs, and that is accomplished by increasing the resistance of the cross-coupling lines of the cross-coupled inverters from FIG.
1
.
FIG. 2
illustrates the same circuit as shown in
FIG. 1
with the exception that resistors R
1
and R
2
are included in the cross-coupling lines of inverters
17
and
18
. The purpose of resistors R
1
and R
2
is to increase the RC time constant delay associated with the gate capacitances of transistors
11
-
14
. The initial effect of an energetic particle strike to a node of SRAM cell
20
, say node S
1
, is to change the voltage of node S
1
. Upset will occur if this voltage change propagates through the cross-coupling of inverters
17
and
18
before the initial voltage of node S
1
can be restored. The increased RC delay can slow the feedback propagation through the cross-coupling and allows more time for recovery of the initially affected node S
1
. But this increase in RC propagation delay also slows the write cycle time of SRAM cell
20
. Because the write cycle of SRAMs has typically been faster than the read cycle, some slowing of the write cycle has been viewed as acceptable, especially since the read cycle time is usually more performance critical. However, as memory cells are scaled to smaller geometries, the speed of the write cycle of SRAM cells becomes more critical than in previous SRAM designs. In addition, it is very difficult to control process parameters under the resistive approach. As a result, the resistive approach to SEU hardening is no longer desirable for SRAMs.
Yet another way to reduce the susceptibility of a memory cell to SEU is to increase the capacitance on the drains of inverters
17
and
18
of memory cell
10
from
FIG. 1
, thus decreasing the voltage change on a node for a given amount of collected charge. Referring now to
FIG. 3
, there is illustrated a schematic diagram of an SEU-hardened SRAM cell using a capacitive approach in accordance with the prior art.
FIG. 3
illustrates the same circuit as shown in
FIG. 1
with the exception that a capacitor C is connected across the drains of inverters
17
and
18
. By having capacitor C located between the gate and drain of inverters
17
and
18
, the effective capacitance is increased by the Miller effect. Also, with capacitor C connected between the gate and drain, a change in the drain voltage will induce a change in the gate voltage such that restoring current is increased. Furthermore, the increased capacitance on the gate will increase the RC delay in the feedback path, thus increasing the resistance to SEUs as well as retarding changes in logic state. However, t

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