Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-12-13
2005-12-13
Lin, Sun James (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000
Reexamination Certificate
active
06976240
ABSTRACT:
Design geometry information from an area outside the area of interest (AOI) on a mask can be combined with inspection information from the AOI to facilitate an accurate, simulated wafer image. The design geometry information can be easily generated or accessed, thereby ensuring an uninterrupted inspection process and minimizing the associated storage costs for the simulation process. The design geometry information can be pseudo design geometry information or actual design geometry information.
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Bever Hoffman & Harms LLP
Harms Jeanette S.
Lin Sun James
Synopsys Inc.
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