Simulation-based selection of evaluation points for...

Details Simulation-based selection of evaluation points for... Simulation-based selection of evaluation points for...

2006-07-25

2006-07-25

Siek, Vuthe (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

Reexamination Certificate

active

07082596

ABSTRACT:
One embodiment of the invention provides a system that uses simulation results to select evaluation points for a model-based optical proximity correction (OPC) operation. Upon receiving a layout, the system first selects critical segments in the layout, and then performs a dense simulation on the critical segments. This dense simulation identifies deviations (or low contrast) between a desired layout and a simulated layout at multiple evaluation points on each of the critical segments. Next, for each critical segment, the system selects an evaluation point from the multiple evaluation points on the critical segment based on results of the dense simulation. The system then performs a model-based OPC operation using the selected evaluation point for each critical segment.

REFERENCES:
patent: 6453457 (2002-09-01), Pierrat et al.
patent: 6574784 (2003-06-01), Lippincott et al.
patent: 6584609 (2003-06-01), Pierrat et al.
patent: 6763514 (2004-07-01), Zhang

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