Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2011-03-08
2011-03-08
Richards, N Drew (Department: 2895)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S694000, C438S695000, C438S699000, C438S703000
Reexamination Certificate
active
07902074
ABSTRACT:
A method for fabricating a semiconductor device comprises patterning a layer of photoresist material to form a plurality of mandrels in a device array region. The method further comprises depositing an oxide material over the plurality of mandrels and over a device peripheral region. The method further comprises forming a pattern of photoresist material over the oxide material in the device peripheral region. The method further comprises anisotropically etching the oxide material from exposed horizontal surfaces in the device array region. The method further comprises selectively etching photoresist material from the device array region and from the device peripheral region.
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Alapati Ramakanth
Niroomand Ardavan
Zhou Baosuo
Knobbe Martens Olson & Bear LLP
Lee Jae
Micro)n Technology, Inc.
Richards N Drew
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