Silverplated vapor deposition chamber

Details Silverplated vapor deposition chamber Silverplated vapor deposition chamber

1978-02-14

1979-11-13

Kaplan, Morris

Coating apparatus

Gas or vapor deposition

Multizone chamber

427 86, C23C 1308

Patent

active

041739442

ABSTRACT:
In a device and process for the deposition of pure semiconductor materials, specially silicon, by thermal decomposition of gaseous compounds of said semiconductor materials on carrier bodies heated to decomposition temperature, wherein the device consists of a silver plated base plate, mounting means and electrical connections thereon for heating the carrier bodies, as well as pipe connections for supply and exhaust of said gaseous compounds, and a bell-shaped cover slipped onto the base plate and forming a gas-tight seal therewith, the improvement that the area of the bell-shaped cover facing the reaction space consists of silver or silverplated steel.

REFERENCES:
patent: 3152933 (1964-10-01), Reuschel
patent: 3240623 (1966-03-01), Heim
patent: 3330251 (1967-07-01), Gutsche
patent: 3524426 (1970-08-01), Ogle, Jr.
patent: 3717439 (1973-02-01), Sakai
patent: 3748169 (1973-07-01), Keller
patent: 3895602 (1975-07-01), Bobenrieth
patent: 3918396 (1975-11-01), Dietze et al.
patent: 3962670 (1976-06-01), Dietze
patent: 4000335 (1976-12-01), Stahl

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