Radiation imagery chemistry: process – composition – or product th – Thermographic process
Patent
1998-08-31
2000-06-06
Le, Hoa Van
Radiation imagery chemistry: process, composition, or product th
Thermographic process
430349, 430351, 430448, G03C 7407
Patent
active
060716789
ABSTRACT:
There is disclosed a silver halide photographic light-sensitive material that contains at least one color-developing agent of formula (I) and at least one dye-forming coupler of formula (II) contained in one or more photographic constitutional layers provided on a base: ##STR1## in formula (I), Z is a carbamoyl group or the like, and Q represents a group of atoms required to form an unsaturated ring together with the C, and in formula (II), M represents a coupler component capable of causing coupling reaction at the site where G is bonded with the oxidized color-developing agent, G is a hydrogen atom or a coupling split-off group, Y.sup.1 and Y.sup.2 each represent a group having a dissociation group, whose pKa is 1 or more but 12 or less, and n and m are each an integer of 0 to 3, provided that n+m.gtoreq.1. There is also disclosed an image-forming method using the light-sensitive material. According to the use of the novel color-developing agent and the coupler having a dissociation group, an image excellent in maximum color density can be provided.
REFERENCES:
patent: 5667945 (1997-09-01), Takeuchi et al.
patent: 5683853 (1997-11-01), Makuta et al.
patent: 5756275 (1998-05-01), Takizawa et al.
patent: 5780210 (1998-07-01), Takeuchi et al.
patent: 5858629 (1999-01-01), Ishikawa et al.
Fuji Photo Film Co. , Ltd.
Le Hoa Van
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