Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2004-06-30
2009-12-01
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S326000, C430S330000, C430S914000, C430S919000, C430S921000, C430S925000, C430S942000, C528S012000, C528S010000, C528S020000, C528S025000, C528S026000, C528S031000
Reexamination Certificate
active
07625687
ABSTRACT:
This invention pertains to a silsesquioxane resin with improved lithographic properties (such as etch-resistance, transparency, resolution, sensitivity, focus latitude, line edge roughness, and adhesion) suitable as a photoresist; a method for in-corporating the fluorinated or non-fluorinated functional groups onto silsesquioxane backbone. The silsesquioxane resins of this invention has the general structure (HSiO3/2)a(RSiO3/2)bwherein; R is an acid dissociable group, a has a value of 0.2 to 0.9 and b has a value of 0.1 to 0.8 and 0.9≦a+b≦1.0.
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Hu Sanlin
Moyer Eric Scott
Wang Sheng
Wyman David Lee
Brady Sharon K.
Dow Corning Corporation
Lee Sin J.
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