Siloxane-based resin and method of forming an insulating...

Details Siloxane-based resin and method of forming an insulating... Siloxane-based resin and method of forming an insulating...

2005-06-21

2005-06-21

Fahmy, Wael (Department: 2813)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

C438S763000

Reexamination Certificate

active

06908977

ABSTRACT:
Disclosed herein is a siloxane-based resin prepared by hydrolyzing and polycondensing a cyclic siloxane compound, a silane compound having three hydrolysable functional groups and a silane compound having three hydrolysable functional groups and one heat-labile functional group, in an organic solvent in the presence of a catalyst and water. Also, disclosed herein is a method of forming an insulating film between interconnect layers of a semiconductor device using the siloxane-based resin thus prepared, whereby an insulating film having low dielectric constant as well as excellent mechanical properties can be obtained.

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patent: 2001-0015883 (2001-02-01), None

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