Siloxane-based resin and a semiconductor interlayer...

Details Siloxane-based resin and a semiconductor interlayer... Siloxane-based resin and a semiconductor interlayer...

2006-07-04

2006-07-04

Nelms, David (Department: 2818)

Active solid-state devices (e.g., transistors, solid-state diode

With means to control surface effects

Insulating coating

C438S623000

Reexamination Certificate

active

07071540

ABSTRACT:
A siloxane-based resin having a novel structure and a semiconductor interlayer insulating film using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties and are useful materials in an insulating film between interconnect layers of a semiconductor device.

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patent: 0 997 497 (2000-05-01), None

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