Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate
2008-01-29
2008-01-29
Tran, Binh X. (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
C439S751000, C439S753000
Reexamination Certificate
active
07323421
ABSTRACT:
A process for etching silicon wafers using a caustic etchant in the form of an aqueous solution comprising water, a hydroxide ion source, and a chelating agent. The process produces silicon wafers substantially free from diffused metal ions.
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Bjelopavlic Mick
Capstick James R.
Doane Thomas E.
Erk Henry F.
Grabbe Alexis
MEMC Electronic Materials , Inc.
Senniger Powers
Tran Binh X.
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