Silicon sidewall etching

Details Silicon sidewall etching Silicon sidewall etching

1997-06-27

1999-04-20

Powell, William

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

438733, 438735, H01L 2100

Patent

active

058952730

ABSTRACT:
Decoupled plasma etching process used to make a protruding structure having vertical or near vertical sidewalls. The decoupled plasma etching process comprises the following steps:

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