Silicon-rich silicon nitrides as etch stops in MEMS manufacture

Details Silicon-rich silicon nitrides as etch stops in MEMS manufacture Silicon-rich silicon nitrides as etch stops in MEMS manufacture

2008-05-28

2011-11-22

Choi, William (Department: 2873)

Optical: systems and elements

Optical modulator

Light wave temporal modulation

C359S290000

Reexamination Certificate

active

08064124

ABSTRACT:
The fabrication of a MEMS device such as an interferometric modulator is improved by employing an etch stop layer between a sacrificial layer and a an electrode. The etch stop may reduce undesirable over-etching of the sacrificial layer and the electrode. The etch stop layer may also serve as a barrier layer, buffer layer, and/or template layer. The etch stop layer may include silicon-rich silicon nitride.

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