Silicon oxide co-deposition/etching process

Details Silicon oxide co-deposition/etching process Silicon oxide co-deposition/etching process

2006-09-26

2006-09-26

Smith, Zandra V. (Department: 2822)

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

C438S787000

Reexamination Certificate

active

07112531

ABSTRACT:
Methods of providing silicon oxide on a substrate in a single process step by simultaneously introducing both a silicon source gas and an etch gas into a CVD chamber. As a result, the method will typically involve simultaneous deposition and etching of the silicon oxide. The method is particularly useful for providing silicon oxide spacers with faceted surfaces.

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