Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1994-08-04
1995-07-18
Mintel, William
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257349, 257351, 257352, 359 59, H01L 2701, H01L 2713
Patent
active
054344417
ABSTRACT:
A semiconductor device has an NMOS transistor and a PMOS transistor formed on at least one monocrystal Si region formed in a thin-film Si layer formed on an insulation layer. The thickness T.sub.BOX of the insulation layer on which the NMOS and PMOS transistors are formed, the voltage V.sub.SS of a low-voltage power supply and the voltage V.sub.DD of a high-voltage power supply for the NMOS and PMOS transistors satisfy a relationship expressed by the following inequality:
REFERENCES:
patent: 4907053 (1990-03-01), Ohmi
patent: 5060035 (1991-10-01), Nishimura et al.
patent: 5225356 (1993-07-01), Omura et al.
patent: 5233207 (1993-08-01), Anzai
patent: 5241211 (1993-08-01), Tashiro
Inoue Shunsuke
Koizuki Toru
Miyawaki Mamoru
Sugawa Shigetoshi
Canon Kabushiki Kaisha
Mintel William
Tran Minhloan
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