Silicon naphthalocyanines and thin radiation sensitive coating f

Details Silicon naphthalocyanines and thin radiation sensitive coating f Silicon naphthalocyanines and thin radiation sensitive coating f

1989-03-10

1991-10-29

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430944, 430945, 540128, G03C 172, C09B 4700, C09B 4704

Patent

active

050615963

ABSTRACT:
Thin radiation sensitive coating films contain silicon naphthalocyanines of the formula ##STR1## where Nc is the radical of a naphthalocyanine system which may be substituted by C.sub.1 -C.sub.10 -alyl or C.sub.1 -C.sub.10 -alkoxy, and

REFERENCES:
patent: 4631328 (1986-12-01), Ringsdorf et al.
patent: 4702945 (1987-10-01), Etzbach et al.
patent: 4749637 (1988-06-01), Hayashida et al.
J. Amer. Chemistry for vol. 106, pp. 7404 to 7410, 1984.
J. Org. Chem. USSR (Engl. Translation) vol. 7, pp. 364 to 366, 1971.

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