Silicon containing resists

Details Silicon containing resists Silicon containing resists

1987-03-18

1988-08-16

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 1566591, 156668, 156904, 427 431, 428447, 430296, 430270, 430313, B44C 122, B29C 3700, C03C 1500, C03C 2506

Patent

active

047642475

ABSTRACT:
The fabrication of improved semiconductor devices having photoresist materials in the form of silicon containing polystyrene copolymers of a halomethylstyrene and an alkylsilylstyrene and the resulting improved semiconductor wafer device containing silicon prior to etching; the resulting resist having reduced resist erosion and improved plasma resiliency.

REFERENCES:
patent: 4551418 (1985-11-01), Hult et al.
patent: 4657843 (1987-04-01), Fukuyama et al.

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